Engineering Functional Oxides at the Atomic Scale
We discover and engineer emergent phenomena in oxide thin films, heterostructures, and freestanding membranes through atomic-scale thin-film epitaxy, nanofabrication, advanced characterization, strain and twist engineering. Our research bridges fundamental materials discovery with the development of next-generation technologies for oxide electronics, energy-efficient devices, and quantum information systems.
Image Courtesy: Jie Sun
Experimental Methods
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Thin-film epitaxy
A custom-built laser MBE system equipped with in situ RHEED and an automated PLD system
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Scanning probe microscopy
The Oxford Instruments Asylum Research MFP-3D Origin+, capable of AFM, PFM, and MFM
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Electronic property measurements
Dielectric, piezoelectric, and ferroelectric measurements on thin-film samples across a wide range of temperatures and electric fields
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Advanced Photon Source
Ultra-bright, high-energy hard X-ray beams, enabling 3D RSM and nanoprobe diffraction studies
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Advanced Light Source
Synchrotron facility that provides access to bright beams ranging from infrared to X-rays, allowing for examining the atomic and electronic structure of matter
Inside Our Lab
Research Highlights
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Deterministic Fabrication of Large-Area, High-Crystallinity Oxide Moiré Superlattices
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Defect-Engineered Scaling of Lead-Free Ferroelectrics with Ultra-Low-Voltage Switching
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Strain-Induced Lead-Free Morphotropic Phase Boundary
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Low-Loss Far-Infrared Surface Phonon Polaritons in Suspended SrTiO3 Nanomembranes
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Size-Induced Ferroelectricity in Antiferroelectric Sodium Niobate Membranes
We gratefully acknowledge our sponsors:
